Contacts:
Alexandr Arbuz
Nurgul Danieva
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Location:
C4, 108
Sample Preparation:
Our Thin Film Deposition Lab specializes in advanced thin film fabrication and characterization. It features two magnetron sputtering systems (with RF, DC, and pulsed DC sources), a plasma-enhanced atomic layer deposition (PEALD) system, and a PECVD dual-zone tube furnace. Characterization tools include a spectroscopic ellipsometer (190–2500 nm) and a profilometer, and a laminar flow bench ensuring clean sample handling.
Ultramicrotome Leica EM UC7 / FC7:
The Kurt J. Lesker LAB-18 Sputtering System is used for thin film deposition of various materials, supporting DC magnetron sputtering for metals like Al, Au, Ag, Pt, Cu, Cr, Ti, W, Mo, Hf, and Zr, as well as RF magnetron sputtering for dielectric materials. It also allows reactive sputtering for compound film deposition, including TiN, TiOx, HfOx, and ZrOx. The system can accommodate samples up to 4 inches in diameter, making it suitable for various research applications.
Life science sample preparation lab:
The Ultratech FIJI G2 Atomic Layer Deposition (ALD) System supports both thermal ALD and plasma-enhanced ALD (PEALD) for precise, nanoscale thin film deposition. It features four jacket-heated precursor lines and enables the deposition of materials such as Al₂O₃, HfO₂, TiO₂, TiN, ZrO₂, and ZnO₂. The system operates with Ar, O₂, and N₂ as process gases and can accommodate samples up to 200 mm in diameter, making it suitable for a wide range of research and device fabrication applications.
Hard Bulk Materials TEM/SEM sample preparation lab:
The MTI Slidable Dual-Zone PECVD Tube Furnace is designed for plasma-enhanced chemical vapor deposition of materials with precise heating and cooling rate control via a sliding furnace. It features a 300W RF plasma source for enhanced film growth and operates at temperatures up to 1200°C. The system supports Ar, O₂, H₂, CH₄, and C₂H₂ as process gases and utilizes an 80 mm diameter tube furnace, making it suitable for a range of thin film and nanomaterial synthesis applications.
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